F3-sX Series
The F3-sX family measures semiconductor and dielectric layers up to 3 mm thick. Such thick layers tend to be rougher and less uniform than thinner layers, which the F3-sX counters with a 10-µm-diameter measurement spot. With it the F3-sX family easily measures materials that are impossible to measure with other instruments. Measurement rates of up to 1 kHz also make the F3-sX a top choice for many in-line applications (e.g. roll-to-roll processes).
Wavelength Options
The F3-sX family uses near-infrared (NIR) light to measure layer thickness - even many layers that are opaque to the eye (such as semiconductors). The 980 nm wavelength version, the F3-s980, is designed for cost-sensitive applications. The F3-s1310 is optimized for measuring heavy-doped-silicon, while the F3-s1550 is intended for the thickest of layers.
Accessories
Accessories include automated mapping stages, a video camera with measurement-spot visualization, and visible-wavelength options that extend thickness measurement capabilities down to 15 nm.
What's Included
- Integrated spectrometer/light source unit
- Single-spot measurement stage with 10µm spot size
- FILMeasure 7.0 reflectance measurement software
- Si reflectance standard
- FILMeasure standalone software for remote data analysis
Model Specifications
| Model | Thickness Range* | Wavelength Range |
|---|---|---|
| F3-s980 | 10µm - 1mm | 960-1000nm |
| F3-s1310 | 15µm - 2mm | 1280-1340nm |
| F3-s1550 | 25µm - 3mm | 1520-1580nm |
Additional Perks
- Library with over 130 materials included with every system, along with access to 100s more
- Applications Engineers available for immediate 24-hour assistance (Mon-Fri)
- Online "Hands On" support (internet connection required)
- Hardware upgrade program
